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Coefficient of Friction (COF)

The coefficient of friction (COF) is a measure of how difficult it is to slide one material over another. The lower the COF, the more easily other materials will slide over it. Typical COFs (static) for dry, solid non-fluoropolymers are 0.3-0.6. Typical COFs for Teflon™ fluoropolymers are 0.05-0.3.


Nonstick is a measure of how readily substances adhere to a material. The lower a material’s surface energy, the better the nonstick characteristics. Teflon™ fluoropolymers have extremely low surface energies, therefore, excellent nonstick characteristics over a wide temperature range.
Teflon properties - Abrasion Resistant

Abrasion Resistance

Teflon™ and Tefzel™ fluoropolymers have very low COFs, making them ideal for a variety of environments. Abrasion resistance can be enhanced with selected inorganic fillers (abrasive glass fibers, powdered metals). Conversely, adding PTFE micropowders to other polymers improves their abrasion resistance.

Unique Electrical Properties

Across environments, Teflon™ and Tefzel™ fluoropolymers have high dielectric strengths, low dielectric constants, low dissipation factors, high specific resistance and excellent attenuation characteristics. Using foamed fluoropolymers enhances these properties, allowing reduced insulation wall thicknesses.
Teflon properties - FDA Comforming

FDA Compliance

Many Teflon™ and Tefzel™ fluoropolymers meet FDA regulations for use in contact with food (FDA, USDA, 3-A Sanitary Standards). Fluorogistx can assist you in selecting the fluoropolymer that best meets your needs.
Teflon properties - Chemical Resistant

Chemical Resistance of Teflon™

Teflon™ fluoropolymers have exceptional chemical resistance, outlasting most plastics, elastomerics and super-alloys, even for the most demanding containment and sealing needs. Very few chemicals (molten alkalai metals and some fluorochemicals excepted) will react with Teflon™ fluoropolymers.
Teflon properties - Chemical Resistant

Chemical Resistance of Tefzel™

Tefzel™ fluoropolymers also have excellent chemical resistance, but are affected somewhat by strong oxidizing acids, organic bases (e.g., amines), sulfonic acids and some low surface tension solvents, particularly at elevated temperatures.
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